Cession6-Multiple FA techniques on advanced ... - eufanet

preparation. Fail always. After. Sample prep. Fault research. &. Localization. Sample. Preparation. For. Physical analysis. Physical analysis. Report. FA request.
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Cession 6 - Multiple FA techniques on advanced technologies Sylvain DUDIT

EUFANET Workshop 2009

Summary

• Typical EFA flow • Application on case of analysis • Focus to put in place for a complex case of analysis – Optical techniques for fault research and localization – The FIB and AFM-P during the analysis – Knowledge for a failure analyst

EUFANET Workshop 2009

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Summary

• Typical EFA flow • Application on case of analysis • Focus to put in place for a complex case of analysis – Optical techniques for fault research and localization – The FIB and AFM-P during the analysis – Knowledge for a failure analyst

EUFANET Workshop 2009

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Typical EFA flow Best case: 1.5 Days Worst case: 18 Days Interaction with designer /Techno / Test needed

Day time 0.2 to 0.5

0.2 to 3

0.2 to 2

0.1 to 0.5

0.2 to 6

0.2 to 2

0.2 to 3

0.2 to 1

Physical analysis

FA_report

EMMI SLS / DLS TRE Frontside preparation FA request

Electrical setup

FIB Setup after preparation

Backside preparation

AFM Prob

Deprocessing

E-beam

… Request Documentations Informations Defect reproduction

Sample preparation

Physical analysis Fail always After Sample prep

Fault research & Localization

EUFANET Workshop 2009

Sample Preparation For Physical analysis

Report

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• Typical EFA flow • Application on case of analysis • Focus to put in place for a complex case of analysis – Optical techniques for fault research and localization – The FIB and AFM-P during the analysis – Knowledge for a failure analyst

EUFANET Workshop 2009

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Case of analysis (1/5) •

Analysis – Test chip analog and digital on 65nm technology – Fail on specific structure to track the problem @ metallization level – Output stuck @ - no evident over consumption observed

IN

OUT



For a failure analysis point of view – Case with no over consumption : Open, bridge, serial defects – Case with over consumption : short to GND, short to VDD,

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Case of analysis (2/5) EMMI results IN



Dynamic EMMI : – – – –



OU T

Transistor commutations High EMMI spot (drawbacks for the low emitter) No functionality after high EMMI spot 3 IV impacted by the failure ?

Next : – Laser stimulation – Goal : best fail understanding

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Case of analysis (3/5) LS results

EMMI results IN



OU T

IN

OU T

Laser Stimulation – SIL220X benefits versus a 100X lenses • Sensitivity, spatial resolution • Best fail understanding • 2 IV impacted by the failure ? (1 in accordance with EMMI result)

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Case of analysis (4/5) LS results IN

EMMI results OU T

IN

OU T



TRE results – Not in total accordance with LS and EMMI – 5 IV impacted by the failure ?

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Case of analysis (5/5) •

Conclusion about fail hypothesis : – Short @ VDD or GND on a very long path – 3 FA techniques of localization with results but without fine localization – DLS technique : Fail (pseudo static fail)

!!! Charge contrast technique use to have the good localization !!!

IN

OUT

EUFANET Workshop 2009

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• Typical EFA flow • Application on case of analysis • Focus to put in place for a complex case of analysis – Optical techniques for fault research and localization – The FIB and AFM-P during the analysis – Knowledge for a failure analyst

EUFANET Workshop 2009

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Fault research & Localization EMMI + SLS Top side

Top & Back side

EMMI static

EBT-Ebeam Tester Top & Back side

PLS – Obic (Liva)

TLS – Obirch (Tiva)

- ESD - Hot carriers - Latch-up Measurement : - Delay - Rise/fall time @ebeam probe point

Back side

- Floating node - Non bias junction - Resistive path

Timing analysis Tester

EMMI + Laser tester

TRE Back side

Measurement : - Delay @transistor level

EMMI Dynamic

EUFANET Workshop 2009

SDL

Dynamic fault tracking: - cross talk - Latch-up

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Fault research & Localization FIB AFM Probing

Electrical characterization by “in situ” contact 60µA

Front side modification

Current leakage mapping

Id/Vd REF

15µA

Id/Vd FAIL Backside modification

Cross-Ebeam Probe Pad section Generation EUFANET Workshop 2009

Charge contrast

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Knowledge for a failure analysis

Knowledge needed :

Knowledge needed :

- Sample Preparation ( // polishing, chemical, micro drill …) - Electrical setup ( Power supplies , DC) - CAD navigation setup – Layout view - Optic Tester ( EMMI+SLS) (collaboration with the designers) - Mechanical deprocessing - Chemical deprocessing - SEM Imaging - Fib editing (F / B) and X-sectioning

Sample Preparation ( // polishing, chemical, micro drill …) - Electrical setup ( Power supplies , DC) - Electrical setup AC : °Pattern conversion & Optimization - CAD navigation setup ° Layout view °Netlist view °Schematic view - Optic Tester 5 ( EMMI+ SLS + TRE + DLS) - E-beam - Comparison with simulation results (close collaboration with the designers) - AFM probing - Mechanical deprocessing - Chemical deprocessing - SEM Imaging - Fib editing ( F / B) and X-sectioning -

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