Fault Isolation Imaging and Atomic Force Nanoprobing ... - eufanet

MultiProbe 2007. CAD Nav-Driven Probe Positioning. With the piezo-driven SNAP stage it is possible to accurately position probes directly from the CAD-NAV ...
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Fault Isolation Imaging and Atomic Force Nanoprobing Solution The World’s Only combined Nanoscale Imaging and Atomic Force Probing Tool

NanoProbing: Solution To Non-Visual Defects

How do you take this © MultiProbe 2007

and obtain this?

CAD Nav-Driven Probe Positioning

With the piezo-driven SNAP stage it is possible to accurately position probes directly from the CAD-NAV files © MultiProbe 2007

PICO Current™

ƒ Software Controlled ƒ PicoAmp Measurements ƒ Triax Guarded ƒ Software Ramping ƒ Broad Range of Gains and Bias ƒ 6 Channels Simultaneously ƒ Integrated into Multiscan®

© MultiProbe 2007

Locating A Fault With Pico Current ™ Suspect resistive contact

90nm SRAM Array Single Cell Fail © MultiProbe 2007

Scanning Capacitance Microscopy Metal Oxide Depletion Region

Vbias

Silicon

Control Voltage

Oscillator ~1GHz

Resonator Detector

Gain

Amplitude Lock-In Phase

Reference

© MultiProbe 2007

Demodulation

~

SCM At The Silicon Level

SRAM at the Si level © MultiProbe 2007

SCM At The Silicon Level: Cross-Section

Intel 3GHz Processor

© MultiProbe 2007

Conventional CV Data

Capacitance test site structure Blue = RX, Gold = PC, Green = CA, Red = M1 © MultiProbe 2007

Pad level C-V measurements

CV Measurements With The AFP

AFP C-V measurements

© MultiProbe 2007

Cap sensor frequency (~1GHz)

Copper At M1

Topography

© MultiProbe 2007

PicoCurrent

AFP Probing - Diode Ramps

n-contact Diode Ramp

© MultiProbe 2007

p-contact Diode Ramp

Drain Source-contact Diode Ramp

Transistor Measurements

I-V Characteristics

Threshold Voltage Characteristics

4pt. Measurement

ƒ 4pt. Measurement ƒ Outer probes

0 >1

m

s on r c i

ble ria a v

ƒ fixed separation distance ƒ force

ƒ Inner probes ƒ variable distance ƒ Sense Force Sense

© MultiProbe 2007

Single “Hot” Line 250mv PicoCurren t Detector

Sub 40nm Line in Topography © MultiProbe 2007

Sub 40nm Line in PicoCurrent

Resistance Vs. Distance

© MultiProbe 2007

Conclusions ƒ AFP offers unique capability to Production and FA ƒ AFP employs advanced instrumentation to ensure productivity and precision: ƒ Low leakage current (fA) measurements ƒ Integration of SPM and EFA techniques ƒ Force feedback controlled probing ƒ Visualize and probe Products ƒ AFP is the tool preferred by Innovators, Inventors and their Customers ƒ Atomic Force Microscopy: The future of Nano-scale electrical measurements!

© MultiProbe 2007