No Slide Title

EE141. 2. 4. Introduction. ENIAC - The First Electronic Computer (1946). 5. Introduction. La Révolution du Transistor. Premier transistor. Bell Labs, 1948. 6.
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EE141

Digital Integrated Circuits A Design Perspective Prentice Hall Electronics and VLSI Series ISBN 0-13-120764-4

Introduction [Adapted from Rabaey’s Digital Integrated Circuits, Second Edition, ©2003 Rabaey, A. Chandrakasan, B. Nikolic]

J. 1

Copyright 2003 J. Rabaey et al.

Introduction

Introduction ‰ Why

is designing digital ICs different today than it was before? ‰ Will it change in future?

2

Introduction

The First Computer The Babbage Difference Engine (1832) 25,000 parts cost: £17,470

3

Introduction

1

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ENIAC - The First Electronic Computer (1946)

4

Introduction

La Révolution du Transistor

Premier transistor Bell Labs, 1948 5

Introduction

The First Integrated Circuits Logique Bipolaire des Années 60

ECL Porte 3-entrées Motorola 1966 6

Introduction

2

EE141

Intel 4004 MicroMicro-processor 1971 2300 transistors 1 MHz operation

7

Introduction

Intel Pentium (IV) Microprocessor

8

Introduction

Transistor Revolution ‰ ‰ ‰ ‰ ‰ ‰ ‰

Transistor –Bardeen (Bell labs) in 1947 Bipolar transistor – Schockley in 1949 First bipolar digital logic gate – Harris in 1956 First monolithic IC – Jack Kilby in 1959 First commercial IC logic gates – Fairchild 1960 TTL – 1962 into the 1990’s ECL – 1974 into the 1980’s

9

Introduction

3

EE141

MOSFET Technology ‰ ‰ ‰ ‰ ‰ ‰ ‰

MOSFET transistor - Lilienfeld (Canada) in 1925 and Heil (England) in 1935 CMOS – 1960’s, but plagued with manufacturing problems PMOS in 1960’s (calculators) NMOS in 1970’s (4004, 8080) – for speed CMOS in 1980’s – preferred MOSFET technology because of power benefits BiCMOS, Gallium-Arsenide, Silicon-Germanium SOI, Copper-Low K, … 10

Introduction

Moore’s Law ‰

‰

In 1965, Gordon Moore predicted that the number of transistors that can be integrated on a die would double every 18 to 14 months (i.e., grow exponentially with time). Amazingly visionary – million transistor/chip barrier was crossed in the 1980’s. ƒ ƒ ƒ ƒ

2300 transistors, 1 MHz clock (Intel 4004) - 1971 16 Million transistors (Ultra Sparc III) 42 Million, 2 GHz clock (Intel P4) - 2001 140 Million transistor (HP PA-8500) 11

Introduction

1975

1974

1973

1972

1971

1970

1969

1968

1967

1966

1965

1964

1963

1962

1961

1960

16 15 14 13 12 11 10 9 8 7 6 5 4 3 2 1 0 1959

LOG2 OF THE NUMBER OF

COMPONENTS PER INTEGRATED FUNCTION

Moore’s Law

Electronics, April 19, 1965. 12

Introduction

4

EE141

Transistor Counts 1 Billion Transistors

K 1,000,000 100,000 10,000 1,000 i386 80286

100

i486

Pentium® III Pentium® II Pentium® Pro Pentium®

8086

10

Source: Intel

1 1975

1980

1985 1990

1995

2000

2005 2010

Projected 13

Introduction

Courtesy, Intel

Moore’s Law in Microprocessors

Transistors (MT)

1000

2X growth in 1.96 years!

100 10

486

1

P6 Pentium® proc

386 286

0.1 8086 8080 8008 4004

8085

0.01 0.001

1970

1980

1990 Year

2000

2010

Transistors on Lead Microprocessors double every 2 years

14

Introduction

Courtesy, Intel

Evolution in DRAM Chip Capacity human memory human DNA

100000000 10000000

64 000 000

4X growth every 3 years!

16 000 000

K b it cap acity/ch ip

4 000 000 1000000

1 000 000 256 000

book

100000

64 000 16 000

10000 4 000 1000

1 000 256

100 64 10 1980

0.07 µm

0.1 µm

0.13 µm

0.18-0.25 µm

0.35-0.4 µm

0.5-0.6 µm

encyclopedia 2 hrs CD audio 30 sec HDTV

0.7-0.8 µm

1.0-1.2 µm

1.6-2.4 µm

page 1983

1986

1989

1992

1995

Year

1998

2001

2004

2007

2010

15

Introduction

5

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Die Size Growth Die size (mm)

100

10 8080 8008 4004

8086 8085

1 1970

286

386

P6 486 Pentium ® proc

~7% growth per year ~2X growth in 10 years

1980

1990 Year

2000

2010

Die size grows by 14% to satisfy Moore’s Law 16

Introduction

Courtesy, Intel

Frequency Frequency (Mhz)

10000

Doubles every 2 years

1000 100 10

8085

1 0.1 1970

8086 286

386

486

P6 Pentium ® proc

8080 8008 4004 1980

1990 Year

2000

2010

Lead Microprocessors frequency doubles every 2 years 17

Introduction

Courtesy, Intel

Power Dissipation Power (Watts)

100 P6 Pentium ® proc 10 8086 286 1 4004

8008

486 386

8085 8080

0.1 1971

1974

1978

1985

1992

2000

Year

Lead Microprocessors power continues to increase Courtesy, Intel

18

Introduction

6

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Power Will Be a Major Problem 100000

18KW 5KW 1.5KW 500W

Power (Watts)

10000 1000

Pentium® proc

100

286 486 8086 386 10 8085 8080 8008 1 4004 0.1 1971

1974

1978

1985 1992 Year

2000

2004

2008

Power delivery and dissipation will be prohibitive 19

Introduction

Courtesy, Intel

Power Density Power Density (W/cm2)

10000 1000 100

Rocket Nozzle Nuclear Reactor

8086 10 4004 Hot Plate P6 Pentium® proc 8008 8085 386 286 486 8080 1 1970 1980 1990 2000 Year

2010

Power density too high to keep junctions at low temp 20

Introduction

Courtesy, Intel

Not Only Microprocessors Cell Phone Small Signal RF

Digital Cellular Market (Phones Shipped)

Power RF

Power Management

1996 1997 1998 1999 2000 Units

48M 86M 162M 260M 435M

Analog Baseband Digital Baseband (DSP + MCU)

(data from Texas Instruments) 21

Introduction

7

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Major Design Challenges ‰

Microscopic issues

‰

ƒ ultra-high speeds ƒ power dissipation and supply rail drop ƒ growing importance of interconnect ƒ noise, crosstalk ƒ reliability, manufacturability ƒ clock distribution

Macroscopic issues ƒ time-to-market ƒ design complexity (millions of gates) ƒ high levels of abstractions ƒ design for test ƒ reuse and IP, portability ƒ systems on a chip (SoC) ƒ tool interoperability

Year

Tech.

Complexity

Frequency

3 Yr. Design Staff Size

Staff Costs

1997

0.35

13 M Tr.

400 MHz

210

$90 M

1998

0.25

20 M Tr.

500 MHz

270

$120 M

1999

0.18

32 M Tr.

600 MHz

360

$160 M

2002

0.13

130 M Tr.

800 MHz

800

$360 M 22

Introduction

Why Scaling? ‰ ‰

‰ ‰

Technology shrinks by 0.7/generation With every generation can integrate 2x more functions per chip; Chip cost does not increase significantly Cost of a function decreases by 2x But … ƒ How to design chips with more and more functions? ƒ Design engineering population does not double every two years…

‰

Hence, a need for more efficient design methods ƒ Exploit different levels of abstraction 23

Introduction

Fundamental Design Metrics ‰ ‰

Functionality Cost ƒ NRE (fixed) costs - design effort ƒ RE (variable) costs - cost of parts, assembly, test

‰

Reliability, robustness ƒ Noise margins ƒ Noise immunity

‰

Performance ƒ Speed (delay) ƒ Power consumption; energy

‰

Time-to-market 24

Introduction

8

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Cost of Integrated Circuits ‰

NRE (non-recurring engineering) costs ƒ Fixed cost to produce the design – design effort – design verification effort – mask generation

ƒ Influenced by the design complexity and designer productivity ƒ More pronounced for small volume products ‰

Recurring costs – proportional to product volume ƒ silicon processing – also proportional to chip area

ƒ assembly (packaging) ƒ test fixed cost cost per IC = variable cost per IC + ----------------volume 25

Introduction

NRE Cost Is Increasing

26

Introduction

Die Cost Single die

Wafer Going up to 12” (30cm) From http://www.amd.com

27

Introduction

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Cost Per Transistor cost:

¢-perper-transistor

1 0.1

Fabrication capital cost per transistor (Moore’s law)

0.01 0.001 0.0001 0.00001 0.000001 0.0000001 1982

1985

1988

1991

1994

1997

2000

2003

2006

2009

2012

28

Introduction

Recurring Costs cost of die + cost of die test + cost of packaging variable cost = ---------------------------------------------------------------final test yield cost of wafer cost of die = ----------------------------------dies per wafer × die yield π × (wafer diameter/2)2 π × wafer diameter dies per wafer = ---------------------------------- − --------------------------die area √ 2 × die area

die yield

= (1 + (defects per unit area × die area)/α)-α 29

Introduction

Defects

 defects per unit area × die area  die yield = 1 +  α  

−α

α is approximately 3 die cost = f (die area)4 30

Introduction

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Yield Example ‰

Example O

wafer size of 12 inches, die size of 2.5 cm2, 1 defects/cm2, (measure of manufacturing process complexity)

O

252 dies/wafer (remember, wafers round & dies square)

O

die yield of 16% 252 x 16% = only 40 dies/wafer die yield !

O

‰

α=3

Die cost is strong function of die area z

proportional to the third or fourth power of the die area

31

Introduction

Some Examples (1994) Chip

Metal layers

Line width

Wafer cost

Def./ cm2

Area mm2

Dies/ wafer

Yield

Die cost

386DX

2

0.90

$900

1.0

43

360

71%

$4

486 DX2

3

0.80

$1200

1.0

81

181

54%

$12

Power PC 601

4

0.80

$1700

1.3

121

115

28%

$53

HP PA 7100

3

0.80

$1300

1.0

196

66

27%

$73

DEC Alpha

3

0.70

$1500

1.2

234

53

19%

$149

Super Sparc

3

0.70

$1700

1.6

256

48

13%

$272

Pentium

3

0.80

$1500

1.5

296

40

9%

$417 32

Introduction

Reliability Noise in Digital Integrated Circuits ‰

Noise – unwanted variations of voltages and currents at the logic nodes

‰

from two wires placed side by side ƒ capacitive coupling

v(t)

– voltage change on one wire can influence signal on the neighboring wire – cross talk

ƒ inductive coupling

i(t)

– current change on one wire can influence signal on the neighboring wire VDD

‰

from noise on the power and ground supply rails ƒ can influence signal levels in the gate 33

Introduction

11

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Example of Capacitive Coupling ‰

Signal wire glitches as large as 80% of the supply voltage will be common due to crosstalk between neighboring wires as feature sizes continue to scale Crosstalk vs. Technology Pulsed Signal 0.12m CMOS 0.16m CMOS

Black line quiet Red lines pulsed

0.25m CMOS

Glitches strength vs technology

0.35m CMOS

From Dunlop, Lucent, 2000

34

Introduction

Static Gate Behavior ‰

‰ ‰

Steady-state parameters of a gate – static behavior – tell how robust a circuit is with respect to both variations in the manufacturing process and to noise disturbances. Digital circuits perform operations on Boolean variables x ∈{0,1} A logical variable is associated with a nominal voltage level for each logic state 1 ⇔ VOH and 0 ⇔ VOL V(x)

‰

V(y)

VOH = ! (VOL) VOL = ! (VOH)

Difference between VOH and VOL is the logic or signal swing Vsw 35

Introduction

DC Operation Voltage Transfer Characteristics (VTC) ‰

Plot of output voltage as a function of the input voltage V(x)

V(y)

V(y)

f

VOH = f (VIL)

V(y)=V(x)

VM

Switching Threshold

VOL = f (VIH) VIL

VIH

V(x) 36

Introduction

12

EE141

Mapping Between Analog and Digital Signals V “ 1”

V OH

V

V IH

out Slope = -1

OH

Undefined Region V “ 0”

V

Slope = -1

IL

V OL

OL V

IL

V

V

IH

in

37

Introduction

Noise Margins ‰

For robust circuits, want the “0” and “1” intervals to be a s large as possible

VDD

VDD "1"

VOH NMH = VOH - VIH

VIH Undefined Region VIL

Noise Margin High Noise Margin Low NML = VIL - VOL

VOL

"0"

Gnd

Gnd Gate Input

Gate Output

‰

Large noise margins are desirable, but not sufficient …

38

Introduction

The Regenerative Property A gate with regenerative property ensure that a disturbed signal converges back to a nominal voltage level

v0

v1

v2

v3

v4

v5

v6

v2

5 V (volts)

‰

v0

3

v1

1 -1 0

2

4

6 t (nsec)

8

10 39

Introduction

13

EE141

Conditions for Regeneration v0

v1

v2

v3

v4

v5

v6

v1 = f(v0) ⇒ v1 = finv(v2)

v3

f(v)

finv(v) v1

v1

v3 finv(v)

v2

v0

Regenerative Gate ‰

f(v)

v0

v2

Nonregenerative Gate

To be regenerative, the VTC must have a transient region with a gain greater than 1 (in absolute value) bordered by two valid zones where the gain is smaller than 1. Such a gate has two stable operating points. 40

Introduction

Noise Immunity ‰

Noise margin expresses the ability of a circuit to overpower a noise source

‰

Absolute noise margin values are deceptive

ƒ noise sources: supply noise, cross talk, interference, offset ƒ a floating node is more easily disturbed than a node driven by a low impedance (in terms of voltage) ‰

Noise immunity expresses the ability of the system to process and transmit information correctly in the presence of noise

‰

For good noise immunity, the signal swing (i.e., the difference between VOH and VOL) and the noise margin have to be large enough to overpower the impact of fixed sources of noise 41

Introduction

Directivity ‰

A gate must be undirectional: changes in an output level should not appear at any unchanging input of the same circuit ƒ In real circuits full directivity is an illusion (e.g., due to capacitive coupling between inputs and outputs)

‰

Key metrics: output impedance of the driver and input impedance of the receiver ƒ ideally, the output impedance of the driver should be zero ƒ input impedance of the receiver should be infinity

42

Introduction

14

EE141

FanFan-In and FanFan-Out ‰

Fan-out – number of load gates connected to the output of the driving gate O

gates with large fan-out are slower N

Fan-in – the number of inputs to the gate

‰

O

gates with large fan-in are bigger and slower

M

43

Introduction

The Ideal Inverter ‰

The ideal gate should have ƒ ƒ ƒ ƒ

infinite gain in the transition region a gate threshold located in the middle of the logic swing high and low noise margins equal to half the swing input and output impedances of infinity and zero, resp. Vout

Ri = ∞ Ro = 0 Fanout = ∞

g=-∞

NMH = NML = VDD/2

Vin

44

Introduction

An Old-time Inverter VOL=0.45V VOH=3.5V VIL=0.66V VIH=2.35V

5.0 4.0

NM

L

3.0

( V)

VM=1.64V o u t

V

NMH= NML=

2.0 VM NM

1.0

0.0

1.0

2.0

H

3.0

4.0

5.0

V in (V) 45

Introduction

15

EE141

Delay Definitions Vin

Vout

Vin Propagation delay input waveform

50%

tp = (tpHL + tpLH)/2

tpHL

t

tpLH

Vout

90%

output waveform

signal slopes

50% 10%

tf

tr

t 46

Introduction

Modeling Propagation Delay ‰

Model circuit as first-order RC network vout (t) = (1 – e–t/τ)V R

where τ = RC

vout C

Time to reach 50% point is t = ln(2) τ = 0.69 τ

vin

Time to reach 90% point is t = ln(9) τ = 2.2 τ

‰

Matches the delay of an inverter gate 47

Introduction

Ring Oscillator : Delay Measurement

v0

v1

v0

v2

v1

v3

v4

v5

v5

T = 2 × tp × N 48

Introduction

16

EE141

A First-order RC Network R

v in

v out CL





0

0

Ein = ∫ iin (t )vin (t )dt = V ∫ C L ∞



0

0

EC L = ∫ iC L (t )vout (t )dt = ∫ C L

V

dvout dt = C LV ∫ dvout = CLV 2 dt 0 V

dvout C V2 vout dt = C L ∫ vout dvout = L dt 2 0 49

Introduction

Power and Energy Dissipation ‰

Power consumption: how much energy is consumed per operation and how much heat the circuit dissipates ƒ supply line sizing (determined by peak power) Ppeak = Vddipeak ƒ battery lifetime (determined by average power dissipation) Pavg= 1/T ∫ p(t) dt = Vdd/T ∫ idd(t) dt p(t) = v(t)i(t) = Vddi(t) ƒ packaging and cooling requirements

‰

Two important components: static and dynamic

E (joules) = CL Vdd2 P0→1 + tsc Vdd Ipeak P0→1 + Vdd Ileakage f0→1 = P0→1 * fclock

P (watts) = CL Vdd2 f0→1 + tscVdd Ipeak f0→1 + Vdd Ileakage 50

Introduction

Power and Energy Dissipation ‰ ‰

Propagation delay and the power consumption of a gate are related Propagation delay is (mostly) determined by the speed at which a given amount of energy can be stored on the gate capacitors ƒ the faster the energy transfer (higher power dissipation) the faster the gate

‰

For a given technology and gate topology, the product of the power consumption and the propagation delay is a constant ƒ Power-delay product (PDP) – energy consumed by the gate per switching event

‰

An ideal gate is one that is fast and consumes little energy, so the ultimate quality metric is ƒ Energy-delay product (EDP) = power-delay 2 51

Introduction

17

EE141

Summary ‰ Digital

integrated circuits have come a long way and still have quite some potential left for the coming decades

‰ Understanding

the design metrics that govern digital design is crucial ƒ Cost, reliability, speed, power and energy dissipation 52

Introduction

18