Ahoutou Paul – KOUAKOU, PhD 4 allée de la chataignerais 78240 Chambourcy Tél. : + 33 (0) 6 28 58 87 35 Mail : [email protected] Current affiliation: LPMIA, Nancy, France

Birth: 02-07-1977 Nationality: Ivorian Single, with no child Mobility at international Immediate availability

Thin film deposition, Plasma diagnostic, Material characterization  Education 2004 – 2008 2003 – 2004 2002 – 2003

PHD thesis “Plasma physics and optoelectronic” at LPMIA (Nancy Université, France) and at SAM (CRPGL, Luxembourg). Postgraduate degree « Plasma, Optical, Electronic and Microsystems » at Nancy Unuversité, France Master’s degree «Physic and Applications» at Nancy Unuversité, France

 Professional Scientific Experience Research activity until 2004

2004 2003

Research Synthesis of CNx and SiCN thin films by Microwave Plasma Assisted Chemical Vapour Deposition and by reactive magnetron sputtering assisted Physical Vapour Deposition Publications 2 publications in international reviews, 13 Conmmunications by posters and oral in national and international conferences. Teaching experience - ESSTIN, Nancy Université “optical physic” practices works - IUT Nancy - Brabois, “Physic mechanic” tutorials Coatching Student coaching (3 months) Stage postgraduate degree (6 months) “Nanotechnology: realization of submicron objects by electronic lithography for SAW (Surface Acoustic Wave) devices” at LPMIA, Nancy Université Stage master (3 months) “reverse piezoelectric effect study by X-ray diffraction: The case of quartz and gallium phosphate” at LCM3B at Nancy Université

 Scientific skills Plasma diagnostic

-Microwave and DC plasma Diagnostic by Optical Emission Spectroscopy -Pulsed plasma diagnostic by Time Resolved Optical Emission Spectroscopy

Thin film deposition

-Thin film deposition by chemical vapour deposition and physical vapour deposition, DC and microwave discharge

Thin film Characterization

-Thin film characterization by MEB, AFM, MET, XPS, Auger, SIMS, FTIR, Raman, DRX, profilometry, ellipsometry, nanoindentation, nanoscratch

Growth mechanism

-Proposition of CVD and PVD thin film growth mechanisms

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 Others skills Computer skills Language Communication Manners Project management

Software for data acquisition and treatment: Origin, Excel, Power point, Latex, Word; System: Windows, Macintosh, notions in programming tools: Matlab, Fortran, Pascal et C++, notions in html, PHP and Internet site creation Fluent in French: reading, writing and speaking currently, English: writing and speaking, some notions of German Ability to work in teams, to write reports, posters, presentations. Ability to present posters and oral communications in international conferences. Adaptable to new technologies; ability to supervise and manage, to transmit knowledge, to make analysis, synthesis and interpretation; adapting to different environments, autonomy Innovative projects, collaboration with industry and research laboratories abroad. Establishment of technical plasma diagnostic products.

 Others Interests Memberships Activities at University

Hobbies

Member of the Nancy Ivorians Association (CINA), President (2005-2006), Vice President (2004-2005), Chairman of the organizing Committee (2003-2004) external auditor (2002-2003) Member of the LPMIA laboratory board (2005-2007), member of the establishment committee of the institute Jean Lamour (2005-2007), member of the organizing committee EMMA2006, participation to the PHD school (Doctoriales Lorraine 2005) -- prices of the innovative project, member of the Network of Excellence Nanobeam. Martial art, foosball, volley ball, dance

 Publications Articles 1. P. Kouakou, V. Brien, B. Assouar, V. Hody, M. Belmahi, H. N. Migeon, J. Bougdira, preliminary synthesis of carbon nitride thin films by N2/CH4 microwave plasma assisted chemical vapor deposition: characterization of the discharge and the obtained films, Plasma Process. Polym. 4, 2007, 210–214 2. P. Kouakou, M. Belmahi, V. Brien, V. Hody, H. N. Migeon, J. Bougdira, Role of silicon on the growth mechanisms of CNx and SiCN thin films by N /CH microwave plasma assisted chemical vapour deposition, Surf. Coat. Technol. 203 (2008) 277–283. 2

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3. P. Kouakou, V. Hody, P. Choquet, M. Belmahi, J. Bougdira, H. N. Migeon, Silicon carbon nitride thin films deposited by magnetron reactive sputtering physical vapour deposition: Structural, chemical and tribological characterization, submitted National and international conferences, colloquiums and workshops 1. 15th International Colloquium on Plasma Processes, Grenoble/Autrans (France), 5-9-June, 2005 2. Doctoriales de Lorraine 2005, PhD school for Innovative society creation, La Bresse, France, 17-21 October 2005 3. Second Francophone colloquium on innovations and thin films applications, Nancy, France, 22-24 November 2005 4. Surface Science day of the Jean Lamour Institut, Ecole des Mines de Nancy, 2

France, 25 - 26 January 2006 5. SFP2006, French Physical Society conference, Pont-à-Mousson, France 2-5 may 2006 6. Materiaux2006, Pluri-disciplinary conferences on materials, Dijon, France, 1317 November 2006. 7. PSE2006, Plasma Surface Engineering, Garmisch-Partenkirchen (Germany), September 10-15, 2006

 References • Pr Mohammed Belmahi LMPIA, Nancy Universuté, Faculté des Sciences et Techniques BP 239, F54506 Vandoeuvre-les Nancy Cedex FRANCE. Email: [email protected] Tel : + 33 (0)3 83 68 49 24 • Pr Jamal Bougdira LMPIA, Nancy Universuté, Faculté des Sciences et Techniques BP 239, F54506 Vandoeuvre-les Nancy Cedex FRANCE. Email: [email protected] Tel : + 33 (0)3 83 68 49 16 • Pr Henri-Noel Migeon SAM. Centre de Recherche Public - Gabriel Lippmann SAM 41, rue du Brill L4422 BELVAUX, Email: [email protected]; Tel: (+352) 47 02 61

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